A webinar co-hosted by Carina Gill, Loughborough Surface Analysis Ltd, and CAMECA explores the enduring relevance of ion implants in dynamic SIMS analysis—an essential technique in semiconductor manufacturing for over five decades.
The session presents the principles behind ion implant characterization and demonstrates how these implants are used to quantify unknown concentrations in materials, ensuring precision across all stages of production.
As SIMS technology continues to evolve, this webinar will highlight the importance of mastering foundational techniques to fully leverage high-resolution mass spectrometry in advanced materials analysis.
⭐ Key learnings will include:
- SIMS in Semiconductor Manufacturing: Understand how dynamic SIMS is applied throughout the production process—from raw wafers to finished devices—to detect all mass ranges, including trace contamination levels (ppb).
- Evolving Analytical Techniques: Explore how SIMS methodologies have advanced over time, while the use of ion implants for quantification has remained a constant for over 50 years.
- Ion Implant Quantification: Learn how to use an ion implant to quantify unknown concentrations in the same material—an essential technique in dynamic SIMS analysis.
- Common Pitfalls to Avoid: Identify frequent errors in ion implantation and discover best practices to ensure accurate and reliable results.
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🎙️ About the speaker:
Carina Gill works at Loughborough Surface Analysis Ltd. a contract analysis lab specialising in magnetic sector SIMS. She completed her undergraduate in Chemistry at the University of Sheffield, with a project focusing on X-ray crystallography. Alongside continuing to work for LSA, Carina is currently studying for a PhD at the University of Nottingham. The aim of the PhD is to develop the use of dynamic SIMS for characterising interstitial species in titanium alloys. |